Revlon PhotoReady Candid Natural Finish Anti-Pollution Foundation 420 SUN BEIGE
Get comfortable! This incredibly creamy, moisturizing and protective foundation has the ingredients you do want, without the ones you don't.
- This skin-enhancing, natural-looking foundation delivers a flawless finish—all day long—as it hydrates
- Medium coverage that feels weightless and looks like your best skin!
- Feels good with: anti-pollution, antioxidant, and anti-blue-light ingredients to protect your skin
- Feels better without: oils, parabens, phthalates, synthetic dyes, and harsh fragrances
Aqua/Water/Eau, Cyclopentasiloxane, Dimethicone, Phenyl Trimethicone, PEG-9 Polydimethylsiloxyethyl Dimethicone, Trimethylsiloxysilicate, Butylene Glycol, Polymethylsilsesquioxane, Polysilicone-11, HDI/Trimethylol Hexyllactone Crosspolymer, Aloe Barbadensis Leaf Extract, Aluminum Starch Octenylsuccinate, Camellia Sinensis Leaf Extract, Cucumis Sativus (Cucumber) Fruit Extract, Dimethicone/PEG-10/15 Crosspolymer, Disteardimonium Hectorite, Ethylene Brassylate, Laureth-7, Lecithin, Magnesium Sulfate, Maris Sal/Sea Salt/Sel Marin, Methicone, Mica, Polyglyceryl-3 Diisostearate, Pullulan, Sclerotium Gum, Silica, Sodium Ascorbyl Phosphate, Sodium Carrageenan, Tetrasodium EDTA, Tocopherol, Tocopheryl Acetate, Triethyl Citrate, Xanthan Gum, Caprylyl Glycol, Phenoxyethanol. May Contain [+/-]: Iron Oxides (CI 77491,77492, 77499), Titanium Dioxide (CI 77891)
Made in USA